| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist stripping apparatus which can smoothly discharge stripped pieces from a stripping tank and recover it, and to provide a resist stripping method. SOLUTION: The resist stripping apparatus includes a lifter 8 for holding a wafer W, a stripping tank 2 which houses the wafer W held by the lifter 8 and a stripper so as to strip the unnecessary dry film (resist) from the wafer W, a chemical supply means to supply the stripper to the stripping tank 2, and a recovery apparatus 11 to recover the stripper or the like discharged from the stripping tank 2. The stripping tank 2 includes a discharging hole on its bottom that has an opening enough to pass through the stripped pieces from the wafer W, the discharging hole 3<SB>1</SB>is closed by a freely opening and closing bottom cover (cover) 6, and the bottom cover 6 is connected with the opening and closing mechanism. The opening and closing mechanism opens the bottom cover 6 so as to discharge the stripped pieces accumulated on the bottom of the stripping tank 2 together with the stripper to the outside of the stripping tank 2. COPYRIGHT: (C)2008,JPO&INPIT
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