| 摘要 |
<p>[PROBLEMS] To provide a method for manufacturing a transparent cured film having a wide exposure margin while maintaining a high level of sensitivity, especially a method for manufacturing a transparent cured film, which can be applied to the manufacture of a TFT flattening film in a semitransmission liquid crystal display element, and is used particularly for simultaneously forming contact holes and reflection concavoconvexes by half exposure. [MEANS FOR SOLVING PROBLEMS] A method for manufacturing a transparent cured film, characterized by comprising stacking two positive-working photosensitive resin layers different from each other in exposure sensitivity on a base material so that the lower-sensitivity positive-working photosensitive resin layer is located between the base material and the higher-sensitivity positive-working photosensitive resin layer, exposing the positive-working resin layers to light, heating the exposed positive-working resin layers, developing the assembly, and post-baking the assembly. A display element comprising a transparent cured film produced by the above method.</p> |
