| 摘要 |
<P>PROBLEM TO BE SOLVED: To enable deposition of metal compound which has crystallization promoting function, optical characteristic, and adhesion to a recording medium for a sputtering target used for deposition of interface film of phase change recording medium. <P>SOLUTION: The sputtering target has such a composition as described ((M<SB>1-a</SB>Si<SB>a</SB>)<SB>1-b</SB>Cr<SB>b</SB>)(O<SB>1-x</SB>N<SB>x</SB>)<SB>z</SB>(in the equation, M means at least one element chosen from Zr and Hf, and a, b, x, and z are numbers which meet the following equations: 0.1≤a≤0.6, 0.1≤b≤0.5, 0<x≤0.7, and 0.5≤z≤2.0 (atom ratio)), and a metal acid nitride film deposited by using the sputtering target is used for interface film 4 and 6 of the phase change recording medium 1. <P>COPYRIGHT: (C)2008,JPO&INPIT |
