| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing device and method. SOLUTION: This substrate processing device comprises a processing section including a processing tank where a processing solution is supplied and stored, and a processing solution supply means for supplying the processing solution to the processing tank, and a drying section including a drying tank where a fluid is supplied and injected, and a fluid supply means for supplying the fluid to the drying tank, wherein the fluid supply means is provided with a filter for filtering before the fluid is supplied to the drying tank, and a first heater for heating the filter. Since the occurrence of particles caused by being supplied to the drying tank while the fluid for drying is solidified is suppressed, this invention has the effect that stable and defectless substrate processing can be obtained resulting in enhancing the production amount or the yield. COPYRIGHT: (C)2008,JPO&INPIT
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