发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device which ensures the connectivity of flip-chip mounting corresponding to lead (Pb)-free and the low rigidity of an interlayer insulation film as well as high reliability of the bonding part. SOLUTION: The method of manufacturing a semiconductor device includes a step to form a first bump electrode 8 on the first electrode 6 of a first substrate 2, a step to form a second bump electrode 11 on the second electrode 10 of a second substrate 3 that has a lower melting point than the first bump electrode 8, a step to make the first and second substrates 2 and 3 face each other and to arrange the first and second bump electrodes 8 and 11, a step to put in an under fill 12 between the first and second substrates 2 and 3 and cure it, and a step to melt the first and second bump electrodes 8 and 11 at higher temperature than the melting point of the first bump electrode 8 and to form a third bump electrode 13 that has an intermediate melting point between the melting point of the first bump electrode 8 and that of the second bump electrode 11. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008071792(A) 申请公布日期 2008.03.27
申请号 JP20060246591 申请日期 2006.09.12
申请人 TOSHIBA CORP 发明人 UCHIDA MASAYUKI;HIGUCHI KAZUTO;TOGASAKI TAKASHI;ITO HISASHI
分类号 H01L21/60;H05K3/34;H05K3/36 主分类号 H01L21/60
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