METHOD OF POLISHING SURFACE OF SUBSTRATE

摘要

FIELD: working of monocrystals. ^ SUBSTANCE: method comprises positioning the substrate surface and chemical-mechanical polishing of the surface with an abrasion suspension and polishing paste. The oriented substrate is clamped on the plate made of a high-melting metal. The substrate is then polished with a polishing plate that is pressed to the substrates with a value of 1-2 kg/cm2 and rotates with a speed of 40-60 m/s. ^ EFFECT: enhanced quality of monocrystals. ^ 1 cl