发明名称 |
Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition |
摘要 |
A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.
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申请公布号 |
EP1903395(A1) |
申请公布日期 |
2008.03.26 |
申请号 |
EP20070018182 |
申请日期 |
2007.09.17 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
SHIBUYA, AKINORI;KATO, TAKAYUKI |
分类号 |
G03F7/039;C08F2/38;C08F2/42 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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