发明名称 Positive photosensitive composition, polymer compounds for use in the positive photosensitive composition, manufacturing method of the polymer compounds, compounds for use in the manufacture of the polymer compounds, and pattern-forming method using the positive photosensitive composition
摘要 A positive photosensitive composition comprises: a polymer compound having an acid-decomposable structure on a terminal of the polymer compound; and a compound capable of generating an acid upon irradiation with actinic ray or radiation.
申请公布号 EP1903395(A1) 申请公布日期 2008.03.26
申请号 EP20070018182 申请日期 2007.09.17
申请人 FUJIFILM CORPORATION 发明人 SHIBUYA, AKINORI;KATO, TAKAYUKI
分类号 G03F7/039;C08F2/38;C08F2/42 主分类号 G03F7/039
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