Mask data generation program, mask data generation method, mask fabrication method, exposure method, and device manufacturing method

摘要

This invention discloses a mask data generation program (47) which causes a computer (1) to generate data (43) of a mask (130) illuminated by an illumination light optical system (110) and used to form a latent image on a photoresist (172) via a projection optical system (172). The mask data generation program causes the computer to execute: a map generation step of Fourier-transforming a function indicating an effective light source to generate a coherent map (42) expressing a coherence distribution on the object plane of the projection optical system, on which the mask is arranged; an arrangement step of arranging a main pattern at the origin of the coherent map and arranging an auxiliary pattern in a region where the coherence with respect to the origin is equal to or higher than a set value; and a data generation step of generating a mask data (43) including the main pattern and the auxiliary pattern which are arranged in the arrangement step.