发明名称 HEAT TREATMENT FURNACE AND MANUFACTURING METHOD THEREOF
摘要 <p>A thermal treatment furnace and a manufacturing method thereof are provided to enhance the durability of the thermal treatment furnace comprising a heating resistor by disposing plural fixing plates on an outside of the heating resistor. A processing vessel contains object to be processed to thermally heat the object to be processed. A cylindrical heat insulating member(4) surround the processing vessel. A helical heating resistor(5) is disposed along an inner circumferential surface of the heat insulating member. Support members are disposed axially on the inner circumferential surface of the heat insulating member. Therefore a heating resistor is supported at predetermined pitches. Plural terminal plates are disposed outside the heating resistor at suitable intervals therebetween and are attached to the heating resistor. The terminal plates radially pass through the heat insulating member to be extended outside. Plural fixing plates(15) are disposed outside the heating resistor at suitable intervals therebetween and are attached to the heating resistor. The fixing plates are fixed in the heat insulating member. The fixing plates are attached to the heating resistor by the same attachment structure as the attachment structure of the terminal plates to the heating resistor.</p>
申请公布号 KR20080027204(A) 申请公布日期 2008.03.26
申请号 KR20070096577 申请日期 2007.09.21
申请人 TOKYO ELECTRON LIMITED 发明人 NAKAO KEN;YAMAGA KENICHI;KOBAYASHI MAKOTO
分类号 H01L21/324;H01L21/205 主分类号 H01L21/324
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