| 摘要 |
<p>A pattern forming method for highly accurately and efficiently forming a permanent pattern such as a wiring pattern by improving exposure performance without causing cost increase of an apparatus nor exposure speed deterioration. The pattern forming method includes at least exposure wherein light from a light irradiation means is modulated to a photosensitive layer by a light modulating means which receives the light from the light irradiation means and modulates the light based on pattern information, and that the light modulated by the light modulating means is permitted to form an image on a plane of the photosensitive layer to be exposed through an imaging means and a focal point adjusting means. In the exposure, the light modulated by the light modulating means is permitted to form the image only in a substantially rectangular region including a center portion of the imaging means, and a short side direction of the substantially rectangular shape is directed toward the swell direction of the photosensitive layer. ® KIPO & WIPO 2008</p> |
