SYSTEM AND METHOD FOR HAZE CONTROL IN SEMICONDUCTOR PROCESSES

摘要

A haze control system and method in a semiconductor process are provided to control efficiently a haze without causing disturbance to mass production in manufacturing equipment. A reticle qualification process is performed to verify a new reticle(302). The reticle is inputted into a semiconductor production process(304). A standard reticle inspection process for the reticle is performed(306). A periodic wafer inspection process is performed to sense a haze defect(308). A reticle clean forecasting system process and a reticle cleaning process are performed(310,312). The reticle is returned to the semiconductor production process(304). The reticle process is finished according to the exhaustion of the lifetime of the reticle(314).