发明名称 |
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
A method for manufacturing a semiconductor device is provided to achieve the reduction in size and increase in density of the semiconductor device, because a wiring structure can be formed on an overlying layer of a radio communication module including elements higher than a mounting surface of an electrical component. A method for manufacturing a semiconductor device comprises the steps of: forming a via plug(301) standing on a conductive layer(302) which forms a shield for shielding a radio communication module(200), and forming a wiring structure(300) by filling the via plug in a dielectric layer(304); and bonding the wiring structure above a wiring substrate(100) where an electronic component which includes an active element(201) and an passive element(202-206) forming the radio communication module, are mounted. |
申请公布号 |
KR20080026028(A) |
申请公布日期 |
2008.03.24 |
申请号 |
KR20070086452 |
申请日期 |
2007.08.28 |
申请人 |
SHINKO ELECTRIC INDUSTRIES CO., LTD. |
发明人 |
FUJII TOMOHARU;OI KIYOSHI |
分类号 |
H01L21/28;H01L27/00 |
主分类号 |
H01L21/28 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|