| 摘要 |
<p>An exposure apparatus (EX) is provided with a setting apparatus (45), which sets an irradiation region (AR) of exposure light (EL) in a first status where a substrate (P) is irradiated with the exposure light (EL). In a second status where the substrate (P) is not irradiated with the exposure light (EL), a second region different from a first region where the exposure light (EL) passes in the first status, in a first plane in contact with a liquid (LQ) of an optical member (FL), is irradiated with the exposure light (EL), and the second region is cleaned with the light. ® KIPO & WIPO 2008</p> |
