发明名称 |
ETCHING APPARATUS AND ETCHING METHOD |
摘要 |
An etching apparatus and an etching method are provided to need no work for sealing the circumference of glass and prevent the waste of an expensive etchant. An etching apparatus includes: an etching chamber(100) in which glass(400) is etched; a cassette(200) which fixes the circumference of the glass and has many fixation units capable of vertically positioning glass within the etching chamber; and a spray device(300) which sprays an etchant(500) on the upper part of the vertically positioned glass to etch the surfaces of the glass uniformly. An etching method includes the steps of: sealing and fixing the circumference of glass using many fixation units provided in the cassette; transferring the cassette to the inside of the etching chamber to place the glass vertically in the etching chamber; moving the spray device to the upper part of the glass, and spraying the etchant on the sides of the glass; and etching the surface of the glass uniformly by making the sprayed etchant flow down to form a water film. |
申请公布号 |
KR20080025880(A) |
申请公布日期 |
2008.03.24 |
申请号 |
KR20060090609 |
申请日期 |
2006.09.19 |
申请人 |
SYSTEMS TECHNOLOGY INCORPORATED |
发明人 |
CHA, HYUK JIN;JANG, CHOL HO |
分类号 |
C03C15/00 |
主分类号 |
C03C15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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