发明名称 ETCHING APPARATUS AND ETCHING METHOD
摘要 An etching apparatus and an etching method are provided to need no work for sealing the circumference of glass and prevent the waste of an expensive etchant. An etching apparatus includes: an etching chamber(100) in which glass(400) is etched; a cassette(200) which fixes the circumference of the glass and has many fixation units capable of vertically positioning glass within the etching chamber; and a spray device(300) which sprays an etchant(500) on the upper part of the vertically positioned glass to etch the surfaces of the glass uniformly. An etching method includes the steps of: sealing and fixing the circumference of glass using many fixation units provided in the cassette; transferring the cassette to the inside of the etching chamber to place the glass vertically in the etching chamber; moving the spray device to the upper part of the glass, and spraying the etchant on the sides of the glass; and etching the surface of the glass uniformly by making the sprayed etchant flow down to form a water film.
申请公布号 KR20080025880(A) 申请公布日期 2008.03.24
申请号 KR20060090609 申请日期 2006.09.19
申请人 SYSTEMS TECHNOLOGY INCORPORATED 发明人 CHA, HYUK JIN;JANG, CHOL HO
分类号 C03C15/00 主分类号 C03C15/00
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