| 摘要 |
<P>PROBLEM TO BE SOLVED: To reduce influence of heating owing to irradiation of exposure beam by a simplified mechanism without impairing airtightness of an optical path space of the exposure beam whose intensity is changeable. <P>SOLUTION: The lighting system which illuminates a specified pattern by an exposure light EL formed of EUV light is provided with an intensity adjusting filer member 22D, a filter holding section provided with a revolver 21 for holding a driving shaft 25A and the filter member 22D, a driving motor 29A to rotate the driving shaft 25A for taking out/putting in the filter member 22D from/to the optical path of the exposure light EL in a high-vacuum space, and cooling pipings 33A, 37A and 38A which are arranged along the revolver 21 and the driving shaft 25A and wherein a coolant is supplied inside. <P>COPYRIGHT: (C)2008,JPO&INPIT |
