| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing synthetic quartz glass member having low striae, suited for a large-sized synthetic quartz glass substrates used for, for example, a large-sized photomask for liquid crystal display, and to provide a method of manufacturing a synthetic quartz glass ingot for obtaining the same. SOLUTION: In a method of growing an ingot while moving a target back and forth when a synthetic quartz glass ingot is manufactured by a direct method comprising vapor phase hydrolyzing or oxidatively decomposing a silica feedstock in a flame formed by a burner to form fine silica particles, then depositing the silica particles on the target, and melting and vitrifying the particles, the method of manufacturing the synthetic quartz glass ingot comprises: (i) continuously feeding the silica feedstock at a predetermined rate, (ii) keeping the flame in constant contact with an overall growing face, (iii) cyclically repeating the back and forth movement of the target at a predetermined speed, and (iv) maintaining the shape of the growing ingot unchanged. COPYRIGHT: (C)2008,JPO&INPIT
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