发明名称 SUBSTRATE TRANSFER APPARATUS, EXPOSURE APPARATUS, COATER-DEVELOPER, EXPOSURE SYSTEM, AND SUBSTRATE TRANSFER METHOD, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To prevent a drop in productivity with the transfer of a substrate. SOLUTION: The substrate transfer apparatus supplies substrates to a processing portion EX-SYS while at the same time collecting the substrates from the processing portion EX-SYS. The substrate transfer apparatus gives priority to a substrate supply process based on information about substrate supply and collection information. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008066463(A) 申请公布日期 2008.03.21
申请号 JP20060241793 申请日期 2006.09.06
申请人 NIKON CORP 发明人 KUMAZAKI KIYOAKI
分类号 H01L21/677;H01L21/027 主分类号 H01L21/677
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