Method for Forming Deep Well in Semiconductor Device,申请号KR20040115773-传众专利搜索

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发明名称	Method for Forming Deep Well in Semiconductor Device
摘要
申请公布号	KR100815935(B1)	申请公布日期	2008.03.21
申请号	KR20040115773	申请日期	2004.12.29
申请人		发明人
分类号	H01L27/06	主分类号	H01L27/06
代理机构		代理人
主权项
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