POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition capable of forming a resist pattern in which line edge roughness (LER) is reduced and a resist pattern forming method.

SOLUTION: The positive resist composition comprises a resin component (A) of which the alkali solubility increases under the action of an acid and an acid generator component (B) which generates an acid upon exposure to light, wherein the resin component (A) comprises a unit having a bridged alicyclic group in a side chain through an acetal bond and a unit having a tertiary ester type acid-dissociable group.

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