| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymerizable resin composition having sufficient sensitivity to light close to 436 nm, to 408 nm and to 365 nm, capable of forming a film or a pattern having high transmittance, and comprising an auxiliary initiator having low sublimability. <P>SOLUTION: The polymerizable resin composition comprises a resin (A), a polymerizable compound (B), an initiator (C), the auxiliary initiator (C-1), a polyfunctional thiol compound (T) and a solvent (D), wherein the auxiliary initiator (C-1) comprises a compound represented by formula (V). <P>COPYRIGHT: (C)2008,JPO&INPIT |
