发明名称 EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To expose a high-quality image of high picture quality which is less in fluctuation of areas of rectangles caused by fluctuation of line width upon forming an image of repeated rectangular patterns in image drawing by digital scanning exposure using a spatial modulation element such as a DMD (Digital Micromirror Device). <P>SOLUTION: The drawing is carried out by controlling a relative scanning direction of a substrate (a medium to be exposed) and a spatial modulation element to be coincident with the short side of the rectangle. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008064989(A) 申请公布日期 2008.03.21
申请号 JP20060241936 申请日期 2006.09.06
申请人 FUJIFILM CORP 发明人 SAIDA HIROBUMI;SUMI KATSUTO
分类号 G03F7/20;G02F1/1335 主分类号 G03F7/20
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