RETICLE FLATNESS MEASURING APPARATUS AND EXPOSURE APPARATUS EQUIPPED WITH RETICLE FLATNESS MEASURING APPARATUS, RETICLE FLATNESS MEASURING METHOD AND EXPOSURE METHOD USING RETICLE FLATNESS MEASURING METHOD, AND METHOD FOR MANUFACTURING DEVICE BY USING EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a reticle flatness measuring apparatus by which the surface profile of the pattern surface of a reticle which is set on an exposure apparatus can be measured with high accuracy.

SOLUTION: A side (rear) other than the pattern surface of the reticle 101 is subjected to the grazing incidence of detection light from an irradiation section 108. Its reflection is received by a light-receiving section 109. An operation part 110 detects a position in the vertical direction of the rear of the reticle 101 on the basis of the output of the light-receiving section 109. A storing part 111 stores information on the thickness of the reticle 101. A control part 112 measures the surface profile of the pattern surface of the reticle 101 by adding the information on the thickness of the reticle 101 to the position information of the rear of the reticle 101 in the vertical direction which is detected by the operation part 110.

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