| 摘要 |
PROBLEM TO BE SOLVED: To provide an aluminum alloy material for lithography, which has an improved uniformity of surface roughening treatment by electrolytic etching and is excellent in bending resistance, scratch resistance and plate cracking resistance, and its manufacturing method. SOLUTION: The aluminum alloy material for lithography comprises, by weight, 0.10-1.00% Fe, 0.01-0.50% Si, 0.001-0.05% Cu, 0.005-0.03% Ti, 0.06-0.3% Mg, 0.001-0.2% Ni and the balance being Al and unavoidable impurities, has a plurality of intermetallic compound particles with a particle size of≥0.1μm in its metallic structure and has a metastable phase dispersed in a material surface at a density of≥60 pieces/mm<SP>2</SP>, wherein the metastable phase contains Al and Fe in a ratio of Fe/Al≤0.60. COPYRIGHT: (C)2008,JPO&INPIT
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