DRAWING DEVICE AND ALIGNMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a pattern drawing device and an alignment method by which drawing can be carried out at an accurate position on a substrate even when a positional relation between a light irradiating unit and an alignment camera changes, without using a high-performance driving mechanism for the alignment camera.

SOLUTION: The pattern drawing device 1 has functions of detecting a shift amount in the relative position of respective alignment cameras 41 to 44 with respect to pulse light projected from an optical head 32 and correcting an alignment amount of a substrate 9 and a starting position of drawing on a substrate 9 based on the detected shift amount. Even when the positional relation between the pulse light projected from the optical head 32 and respective alignment cameras 41 to 44 varies, drawing can be carried out while correcting the varied amount. Therefore, the pattern drawing device 1 is capable of drawing a pattern at an accurate position on the substrate 9.

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