发明名称 LIQUID TREATMENT EQUIPMENT, LIQUID TREATMENT METHOD, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide liquid treatment equipment which can control a location space of piping when supplying air adjusted in temperature/humidity to a liquid treatment unit for liquid-treating a substrate. SOLUTION: The liquid treatment equipment includes an air suction passage 52 which sucks air in a clean room to take it into a driving power room, a temperature adjusting portion 65 which is located in the divided driving power room and adjusts the air taken in through the air suction passage 52 at least for a temperature, an air supply passage 51 for supplying the air from the air adjusting portion to a liquid treatment unit, a ventilation means 63 which sucks the air from the air suction passage 52 to supply the air through the air supply passage 51, and a cleaning filter 64 for cleaning the air taken in from the air suction passage 52. In addition, the air suction passage 52 and the air supply passage 51 are constituted so as to be formed of one and the other of an inside space of an inside pipe of a double pipe and a space between an inside pipe and the inside pipe of the double pipe. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008066595(A) 申请公布日期 2008.03.21
申请号 JP20060244653 申请日期 2006.09.08
申请人 TOKYO ELECTRON LTD 发明人 MATSUOKA NOBUAKI
分类号 H01L21/027 主分类号 H01L21/027
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