发明名称 MEDIUM FOR ETCHING OXIDIC, TRANSPARENT, CONDUCTIVE LAYERS
摘要 The invention relates to a novel dispersible medium for etching doped tin oxide layers with a non-Newtonian flow behavior in order to etch surfaces during the production of displays and/or solar cells. Also disclosed is the use of said medium. The inventive medium is provided particularly in the form of particle-free compositions, by means of which selective fine structures can be etched without damaging or attacking adjacent surfaces. ® KIPO & WIPO 2008
申请公布号 KR20080025757(A) 申请公布日期 2008.03.21
申请号 KR20087003019 申请日期 2008.02.04
申请人 MERCK PATENT GMBH 发明人 STOCKUM WERNER;KUEBELBECK ARMIN
分类号 C03C15/00 主分类号 C03C15/00
代理机构 代理人
主权项
地址