| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a technique which enables achievement of good spot formation by suppressing an excessive reduction of a quantity of light of light beams related to the formation of spots corresponding to an outermost element. <P>SOLUTION: The line head comprises a transparent substrate which can pass the light beams, a plurality of light emitting element groups each with a plurality of light emitting elements formed on a rear face of the transparent substrate, and a plurality of imaging lenses arranged on the front face side of the transparent substrate correspondingly by one to one to the plurality of light emitting element groups. For each of the plurality of light emitting element groups, when the light emitting element most separated from an optical axis of the imaging lens is defined as the outermost element, and a region of the front face of the transparent substrate where the light beam emitted from the outermost element can pass without being totally reflected at the front face is defined as an outermost pass region, a radius of the imaging lens is larger than a distance between the optical axis and a position most separated from the optical axis of the imaging lens of the outermost pass region. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
