| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist remover composition and a method of removing and decomposing a resist by using the composition, in particular, a resist remover composition containing a carbamate compound. SOLUTION: The resist remover composition comprises (a) a cyclic lactone compound and (b) an amide compound, a carbamate compound or their mixture. The resist remover composition has effects of selectively decomposing a resist residue produced upon removing a resist in a process by ozone, significantly improving a number of processed products and preventing corrosion in a metal wiring or an oxide film. COPYRIGHT: (C)2008,JPO&INPIT |
