发明名称 WIRING PATTERN, ELECTRONIC ELEMENT USING IT, ORGANIC SEMICONDUCTOR ELEMENT, LAMINATING WIRING PATTERN AND LAMINATING WIRING SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a wiring pattern which has little protuberance at an angular part of a conductive pattern, and a good insulating characteristic even in the case of a laminating wiring structure through an insulating layer, and to provide an electronic element using it and the like. SOLUTION: An energy is applied to a wettability change layer 2 to form a high surface energy part 3 and a conductive pattern 5 is formed thereon with a conductive liquid to form a wiring pattern 1. At that time, a shape in plan view of the conductive pattern is a rectangular wiring shape in which the angular part is chamfered, and the shape in sectional view is a substantially flat shape as a whole which has little protuberance at the angular part, and in which the angular part is contiguous to a pattern central part smoothly. A laminating wiring pattern and a laminating wiring substrate are constituted by using the wiring pattern 1. Alternatively, a semiconductor layer is formed so as to come into contact with a low surface energy part of the wettability change layer 2 and an electronic element and an organic semiconductor element are constituted. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008066567(A) 申请公布日期 2008.03.21
申请号 JP20060243988 申请日期 2006.09.08
申请人 RICOH CO LTD 发明人 TOMONO HIDENORI;KAWASHIMA IKUE;SUZUKI YUKIE;AKIYAMA ZENICHI
分类号 H01L21/3205;H01L21/28;H01L21/288;H01L21/336;H01L23/52;H01L29/41;H01L29/786;H01L51/05;H01L51/30;H01L51/40 主分类号 H01L21/3205
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