| 摘要 |
<P>PROBLEM TO BE SOLVED: To deposit a porous optical thin film having a low refractive index using reactive sputtering. <P>SOLUTION: The inside of a film deposition chamber 20 is provided with: a first partition member 13 surrounding a discharge space near a target 11; and a second partition member 14 adjacent to the partition member 13. Holes 13a, 14a for allowing sputtering particles to pass through are formed at the respective partition members 13, 14. The discharge space by the first partition member 13 is supplied with a sputtering gas and the reaction space by the second partition member 14 is supplied with a reaction gas. By performing film deposition in a state where the pressure in the discharge space is made higher than that in ordinary sputtering, while retaining a suitable film deposition rate, a porous film of high quality with the low refractive index which has been sufficiently reacted can be stably deposited. <P>COPYRIGHT: (C)2008,JPO&INPIT |
