发明名称 WAFER PROCESSING METHOD, AND WAFER PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To apply a die attach paste to a wafer in a short time, without the use of a die attach film. <P>SOLUTION: A wafer processor (10) includes a grinding means (80) which grinds the rear surface (22) of a wafer (20) where a circuit pattern (C) is formed on its surface (21), and a die attach paste application means (30), which applies a die attach paste to the entire rear surface of the wafer that has been ground by the grinding means. The die attach paste application means is a spin-coating means (30A) for spin-coating the die attach paste supplied to the rear surface of the wafer, or a screen printing means (30B) which screen-prints the die attach paste on the rear surface of the wafer. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008066653(A) 申请公布日期 2008.03.21
申请号 JP20060245645 申请日期 2006.09.11
申请人 TOKYO SEIMITSU CO LTD 发明人 HAYASHI TOMOO
分类号 H01L21/52;H01L21/301;H01L21/304;H01L21/683 主分类号 H01L21/52
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