发明名称 APPARATUS FOR PROVIDING A DIVIDED GAS
摘要 A gas supply apparatus is provided to achieve stabilized gas supply into each process chamber when an error occurs in a main supply part by employing a backup supply part branched from a divert valve assembly and connected to each process chamber. A gas supply apparatus comprises a gas supply part(160), a divert valve assembly(130), a main supply part(110), and a backup supply part(120). The gas supply part supplies or blocks a flow of process gas that is discharged from a gas bomb(161) by a main inlet valve(162). The divert valve assembly supplies the process gas from the gas supply part in different passages. The main supply part distributes the process gas from the divert valve assembly in each process chamber(50). The backup supply part is branched from the divert valve assembly and connected between the process chamber and the main supply part, for bypassing and supplying the process gas to each process chamber when an error occurs in the main supply part.
申请公布号 KR20080025575(A) 申请公布日期 2008.03.21
申请号 KR20060090234 申请日期 2006.09.18
申请人 LG.PHILIPS LCD CO., LTD. 发明人 WOO, KWANG IL
分类号 H01L21/02 主分类号 H01L21/02
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