发明名称 MANUFACTURING METHOD OF THIN FILM TRANSISTOR SUBSTRATE, THIN FILM TRANSISTOR SUBSTRATE, AND LIQUID DISPLAY DEVICE EQUIPPED WITH THE THIN FILM TRANSISTOR SUBSTRATE, AND DETECTION APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a thin film transistor substrate which restrains deterioration of manufacturing yield and reliability of a TFT by minimizing the number of masks. <P>SOLUTION: The method has a first process for forming a first lamination part constituting a gate line 1 and a second lamination part constituting a part of a source line 2 by sequentially forming a first conductive film, a first insulating film, a first semiconductor film, a second semiconductor film and a second conductive film on an insulating substrate and then carrying out patterning, a second process for forming a TFT 5 by exposing a part of the first semiconductor film by patterning each first lamination part, a third process for forming contact holes 16a to 16e by forming a second insulating film to cover each first lamination part and each second lamination part and then carrying out patterning and a fourth process for forming a conductive part 17a constituting the rest of the source line 2 and a picture element electrode 17b by forming a third conductive film to cover the second insulating film and then carrying out patterning. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008066537(A) 申请公布日期 2008.03.21
申请号 JP20060243299 申请日期 2006.09.07
申请人 SHARP CORP 发明人 YAMAZAKI CHIKAO;NAKADA YUKINOBU;HARA YOSHIHITO;MATSUMOTO TAKAO
分类号 H01L21/336;G02F1/1368;G09F9/30;H01L29/786 主分类号 H01L21/336
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