发明名称 ETCHING APPARATUS AND ETCHING METHOD
摘要 An etching apparatus and a method for etching a glass using the same are provided to etch the glass without sealing a circumference of glass and to prevent waste of an expensive etching liquid. An etching apparatus includes an etching chamber(100) for performing etching of a glass(400); a fixing unit(200) for fixing an outer circumferential surface of the glass and positioning the glass in a perpendicular direction within the etching chamber; and a spraying device(300) for spraying an etching liquid(500) onto a top of the glass positioned in the perpendicular direction, so that the etching liquid is flowing down to etch the surface of glass uniformly. In the etching apparatus, the fixing unit includes a sealing unit and a buffer pad. The spraying device sprays the etching liquid optionally only onto one side of the glass. The etching apparatus further includes a etching liquid circulating device and a foreign matters filtrating device.
申请公布号 KR20080025492(A) 申请公布日期 2008.03.21
申请号 KR20060090027 申请日期 2006.09.18
申请人 SYSTEMS TECHNOLOGY INCORPORATED 发明人 CHA, HYUK JIN;NOH, SEUNG MIN;KIM, JAE HWAN
分类号 C03C15/00 主分类号 C03C15/00
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