AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME

摘要

A composition for forming a low-temperature curable protection film is provided to obtain a protection film having excellent mechanical strength, wear resistance and barrier property at a low temperature of 100-250 deg.C. A composition for forming a low-temperature curable protection film comprises: (a) an organosiloxane polymer; (b) a photobase generator; and (c) an organic solvent. The photobase generator is used in an amount of 0.1-15 wt% based on the total solid content of the organopolysiloxane. The composition is coated on a substrate, followed by drying, exposure and heat treatment, to provide a protection film.