发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To obtain a semiconductor device which does not generate an electrical short circuit between an upper electrode and a bit line contact plug even if a design dimension is miniaturized in a semiconductor device with a capacity element. <P>SOLUTION: The semiconductor device has a plurality of capacity elements 41, an upper insulating film 34 and a second layer insulating film 28 composed of different materials and formed on each capacity element 41, and a bit line contact plug 31 formed in a region between the capacity elements 41 and connected to a bit line 33. The upper electrode 27 has an upper electrode opening in a region wherein the bit line contact plug 31 is formed, and the diameter of the upper electrode opening is larger than that of a portion passing through the upper insulating film 34 in the bit line contact plug 31. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008066530(A) 申请公布日期 2008.03.21
申请号 JP20060243180 申请日期 2006.09.07
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 HISA MITSUO
分类号 H01L21/8242;H01L27/108 主分类号 H01L21/8242
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