发明名称 METHOD FOR MANUFACTURING SUBSTRATE FOR ELECTRO-OPTICAL DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a substrate for an electro-optical device by which the number of steps in the production process of a substrate for an electro-optical device can be reduced to improve production efficiency, an electro-optical device can be made thin and the viewing angle of the light transmitting a pixel region can be widened. <P>SOLUTION: The method includes steps of: forming a plurality of minute recessed portions on the surface of a first substrate 3a by a mechanical means; and etching the surface of the first substrate 3a to reduce the thickness of the first substrate 3a and isotropically erode the minute recessed portions to form microlenses L. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008065249(A) 申请公布日期 2008.03.21
申请号 JP20060245757 申请日期 2006.09.11
申请人 SEIKO EPSON CORP 发明人 ITO ATSUSHI;ONIZUKA TATSUYA;SAKAMOTO TAKESHI
分类号 G02F1/1333;G02F1/1335;G09F9/00;G09F9/30 主分类号 G02F1/1333
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