| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a surface light emitting element capable of forming a surface light emitting element more improved in light emission efficiency, to provide an image reading device and an image writing device using the surface light emitting device, and to provide the manufacturing method of the surface light emitting element. <P>SOLUTION: The surface light emitting element is formed through a method of forming a high carrier concentration region 101 or 102 which functions as a p-type semiconductor layer or an n-type semiconductor layer, at a specific part of a semiconductor substrate besides an epitaxial film forming method, such as an MOCVD method, an MBE method, etc, through which a film is formed on all the surface of the semiconductor substrate. The high carrier concentration region 101 or 102 formed at the specific position reduces an electric contact resistance of ohmic contact between an electrode and the semiconductor layer, and furthermore moves a light emitting region Lc of the semiconductor substrate located around an electrode 87, to a position that is not shaded with the electrode 87. <P>COPYRIGHT: (C)2008,JPO&INPIT |
