| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method and a system for manufacturing a thin film capable of suppressing variance in quality of products for each batch. <P>SOLUTION: The method for manufacturing a thin film using an apparatus 1 for manufacturing a thin film has a step of depositing a thin film 113 on a substrate 8 by executing (a) the film deposition batch treatment L. The step (a) includes a step (a1) of holding the substrate 8 by opposing electrodes 2, a step (a2) of introducing a gas L containing a raw material of the thin film 113 in a film deposition chamber 6, and a step (a3) of depositing the thin film 113 on the substrate 8 by applying the high frequency power 105 between a discharge electrode 3 and the opposing electrodes 2 while introducing the gas L. The step (a) is executed after the self-cleaning N of the apparatus 1 for manufacturing the thin film and before the next self-cleaning N'. In the step (a3), the high frequency power 105 is controlled based on the number L of the film deposition batch treatments to be executed by the apparatus 1 for manufacturing the thin film from the self-cleaning N to the film deposition batch treatment L. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
