发明名称 MAGNETIC SEMICONDUCTOR THIN FILM AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a magnetic semiconductor thin film, along with its manufacturing method, of group II-IV-V<SB>2</SB>which is excellent in compatibility with a semiconductor process, and in which a substrate lattice-matches with the magnetic semiconductor thin film, with less variation of Tc near 300 K. SOLUTION: After a buffer layer is formed on the substrate that is heated, ZnSnAs<SB>2</SB>is epitaxial-grown to which a transition metal element is added as a magnetic semiconductor layer, on the buffer layer. The heating temperature of the substrate is 250-350°C. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008060474(A) 申请公布日期 2008.03.13
申请号 JP20060238022 申请日期 2006.09.01
申请人 NAGAOKA UNIV OF TECHNOLOGY 发明人 UCHITOMI NAOTAKA
分类号 H01L21/20;H01F10/193;H01F41/30;H01L29/82;H01L43/08;H01L43/12 主分类号 H01L21/20
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