| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion beam irradiation apparatus for injecting an ion beam uniformly into a substrate and having high flexibility in movement of a holder. SOLUTION: The ion beam irradiation apparatus 1 which irradiates a substrate held by a holder 9 provided in a vacuum chamber 10 with ion beam advancing along the Z-axis direction, comprises a Z-axis slide mechanism 3 moving the holder 9 along the Z-axis direction and a Y-axis slide mechanism 2 making the holder 9 to rise and fall along Y-axis direction. The Z-axis slide mechanism 3 includes a Z-axis slider unit 6 provided with the holder 9 and sliding back and forth along the Z-axis direction, a Z-axis guide 7 guiding the Z-axis slider unit 6 along the Z-axis direction, a Z-axis driving motor 8 provided to make the Z-axis slider unit 6 slide back and forth. The Y-axis slide mechanism 2 includes a Y-axis guide 4 guiding the Z-axis guide 7 along the Y-axis direction, and a Y-axis driving motor 5 provided to make the Z-axis guide 7 slide back and forth along the Y-axis direction. COPYRIGHT: (C)2008,JPO&INPIT
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