发明名称 Lithographic apparatus and device manufacturing method
摘要 A positioning device configured to position a first and a second movable object in a substantially common operation area is presented. The positioning device includes a first coil assembly arranged next to the operation area, a second coil assembly arranged at an opposite side of the operation area, one or more first magnets arranged on the first movable object and configured to cooperate with the first coil assembly, and one or more second magnets arranged on the second movable object and configured to cooperate with the second coil assembly.
申请公布号 US2008062394(A1) 申请公布日期 2008.03.13
申请号 US20060518487 申请日期 2006.09.11
申请人 ASML NETHERLANDS B.V. 发明人 BUTLER HANS;GERARDUS KLAASSEN FRANCISCUS ANDRIANUS
分类号 G03B27/52 主分类号 G03B27/52
代理机构 代理人
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