Photolithography Apparatus Having Mirror for Correcting Aberrations in Optical Illumination System and Mirror Having Aberration Correcting Part

摘要

A photolithography apparatus includes an optical illumination system. The optical illumination system includes a light source, an illumination system, a photomask, and a projection system. The light source generates light. The illumination system transmits the light generated by the light source. The photomask receives the light transmitted by the illumination system and forms an optical pattern image. The projection system transmits the optical pattern image formed by the photomask to a substrate surface. Either one of the illumination system and the projection system includes at least one mirror for correcting aberrations.