发明名称 DEVICE WITH PB-BASED HIGH-K DIELECTRIC THIN-FILM CAPACITOR COMPRISING PB-DONATING LAYERS
摘要 The present invention relates to a device comprising a semiconductor substrate layer and a capacitor with a metal bottom electrode layer, a metal top electrode layer and a lead-containing dielectric layer between the bottom and top electrode layers. A bottom lead-donating layer is arranged between the substrate layer and the bottom electrode layer, and a top lead-donating layer is arranged on top of the top electrode layer. This capacitor structure can be fabricated with a particularly high relative permittivity. The provision of the device of the first aspect of the invention is particularly useful in device applications that require capacitor structures with a high capacitance density, such as ESD protection and other filter applications.
申请公布号 WO2008028660(A2) 申请公布日期 2008.03.13
申请号 WO2007EP07784 申请日期 2007.09.06
申请人 NXP B.V.;ROEST, AARNOUD;KLEE, MAREIKE;MAUCZOK, RUEDIGER;JOEHREN, MICHAEL 发明人 ROEST, AARNOUD;KLEE, MAREIKE;MAUCZOK, RUEDIGER;JOEHREN, MICHAEL
分类号 H01L21/02;H01L23/64 主分类号 H01L21/02
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