DEVICE WITH PB-BASED HIGH-K DIELECTRIC THIN-FILM CAPACITOR COMPRISING PB-DONATING LAYERS
摘要
The present invention relates to a device comprising a semiconductor substrate layer and a capacitor with a metal bottom electrode layer, a metal top electrode layer and a lead-containing dielectric layer between the bottom and top electrode layers. A bottom lead-donating layer is arranged between the substrate layer and the bottom electrode layer, and a top lead-donating layer is arranged on top of the top electrode layer. This capacitor structure can be fabricated with a particularly high relative permittivity. The provision of the device of the first aspect of the invention is particularly useful in device applications that require capacitor structures with a high capacitance density, such as ESD protection and other filter applications.
申请公布号
WO2008028660(A2)
申请公布日期
2008.03.13
申请号
WO2007EP07784
申请日期
2007.09.06
申请人
NXP B.V.;ROEST, AARNOUD;KLEE, MAREIKE;MAUCZOK, RUEDIGER;JOEHREN, MICHAEL
发明人
ROEST, AARNOUD;KLEE, MAREIKE;MAUCZOK, RUEDIGER;JOEHREN, MICHAEL