| 摘要 |
PROBLEM TO BE SOLVED: To make improvement in photosensitivity compatible with improvement in optical characteristics by arranging an intralayer optical filter without expanding a distance between a light-receiving face of a photodiode (a photoelectric conversion part) and a microlens. SOLUTION: A rear-side irradiation structure and an intralayer optical filter structure are combined with each other, so that a laminated film including an IR cut filter 210 and an intralayer lens 211 is formed on the rear side of a silicon substrate 200 while the microlens 214 is arranged on the upper face of the laminated film via a color filter 213. The IR cut filter 210 is composed by alternately laminating a plurality of SiO films and SiN films or the like. By such a structure, there is no laminated film of a multilayer wiring structure between the photodiode 201 and the microlens 214. Therefore, it is possible to achieve the improvement in sensitivity while reducing the distance between the light-receiving face of the photodiode 201 and the microlens 214. COPYRIGHT: (C)2008,JPO&INPIT
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