| 摘要 |
A photo-mask for a micro lens of a CMOS image sensor includes a transparent substrate, a plurality of light-shielding patterns for shielding light, a plurality of semi-shielding patterns which respectively surround the plurality of light-shielding patterns, and a unit mask pattern for the unit micro lens including a complete-shielding region provided over the light-shielding pattern, a semi-shielding region provided over the semi-shielding pattern, and a complete-transmitting region provided over the substrate.
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