| 摘要 |
Fluids for use in immersion lithography systems and methods of forming thereof are disclosed. In accordance with a preferred embodiment, a fluid for immersion lithography includes a liquid and a plurality of first atoms disposed in the liquid. The plurality of first atoms comprises at least one set of the plurality of first atoms arranged in a shape of a fullerene, the fullerene having an interior. At least one second atom is disposed in the interior of the at least one set of the plurality of first atoms arranged in the shape of the fullerene.
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