发明名称 |
NANOMETER-LEVEL MIX-AND-MATCH SCANNING TIP AND ELECTRON BEAM LITHOGRAPHY USING GLOBAL BACKSIDE POSITION REFERENCE MARKS |
摘要 |
<p>An interferometric-spatial-phase imaging (ISPI) system includes a substrate wafer. An alignment configuration is permanently embedded in tbe substrate wafer. The alignment configuration uses a global coordinate reference system by providing a plurality of global reference marks that encompass up to the entire substrate wafer. A plurality of alignment markings is provided on a surface in close proximity to the alignment configuration for obtaining continuous six-axis control to provide positional information of a scanning probe tip or an electron beam with respect to said global coordinate reference system.</p> |
申请公布号 |
WO2008030929(A1) |
申请公布日期 |
2008.03.13 |
申请号 |
WO2007US77718 |
申请日期 |
2007.09.06 |
申请人 |
MASSACHUSETTS INSTITUTE OF TECHNOLOGY;MOON, EUCLID, E. |
发明人 |
MOON, EUCLID, E. |
分类号 |
G03F9/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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