| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate support apparatus capable of securing the reproducibility of substrate movement without inviting the decline of guide accuracy due to wear. <P>SOLUTION: A lift mechanism 70 for supporting a wafer W and elevating and lowering it in a vertical direction comprises: a plurality of lift pins 77 capable of holding, elevating and lowering the wafer W; a base 71 where the lift pins 77 are erected; a guide device (elastic hinge device) 72 provided on the lower part of the base 71; and a voice coil motor 73 for driving the lift pins 77 in the vertical direction through the guide device 72 and the base 71. The guide device 72 is constituted of a pair of leaf springs 72a and 72b piled up and disposed so as to be continued in the vertical direction, and the leaf springs 72a and 72b are formed by an elastically deformable material and thickness for a stroke amount of the lift pin 77 to move between a sinking position and a projecting position. <P>COPYRIGHT: (C)2008,JPO&INPIT |
