发明名称 DIFFRACTIVE OPTICAL ELEMENT, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A diffractive optical element is disclosed. The diffractive optical element is used in an illumination optical system of an exposure apparatus which exposes a substrate, and used for forming the intensity distribution of light at a pupil plane of the illumination optical system. The diffractive optical element comprises a first diffractive element and a second diffractive element which have different diffraction actions from each other, wherein each of the first diffractive element and the second diffractive element has point symmetry in a irradiated region where light is irradiated and common center of the point symmetry.
申请公布号 US2008062509(A1) 申请公布日期 2008.03.13
申请号 US20070849770 申请日期 2007.09.04
申请人 CANON KABUSHIKI KAISHA 发明人 UEMURA TAKANORI
分类号 G02B3/00;G02B5/18;G02B5/30 主分类号 G02B3/00
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